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Saturday, April 25, 2020 | History

3 edition of Applications of radio-frequency power to plasmas found in the catalog.

Applications of radio-frequency power to plasmas

seventh topical conference, Kissimmee, FL, 1987

by

  • 203 Want to read
  • 15 Currently reading

Published by American Institute of Physics in New York .
Written in English

    Subjects:
  • Plasma heating -- Congresses.,
  • Tokamaks -- Congresses.

  • Edition Notes

    Statementeditors, S. Bernabei & R.W. Motley.
    SeriesAIP conference proceedings ;, 159, AIP conference proceedings ;, no. 159.
    ContributionsBernabei, S., Motley, Robert W., Princeton University. Plasma Physics Laboratory., American Physical Society., United States. Dept. of Energy., APS Topical Conference on Applications of Radio-Frequency Power to Plasmas (7th : 1987 : Kissimmee, Fla.)
    Classifications
    LC ClassificationsQC718.5.H5 A67 1987
    The Physical Object
    Pagination467 p. :
    Number of Pages467
    ID Numbers
    Open LibraryOL2413730M
    ISBN 100883183595
    LC Control Number87071812

    From Preface: "This book covers the physics of high-power laser interaction with plasmas, a subject related to both fundamental physics and the applied sciences. The plasma medium varies from low densities (dilute gases) to very high densities (highly-compressed solid state).Author: Anya Bartelmann. The effect of radio frequency plasma processing reactor circuitry on plasma characteristics Shahid Raufa) and Mark J. Kushnerb) Department of Electrical and Computer Engineering, University of Illinois, West Green Street, Urbana, Illinois ~Received 20 . radio frequency technology for plasma applications This course provides knowledge of RF principles and the ability to plasma processes. Location: Courses at the Customer Site.


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Applications of radio-frequency power to plasmas Download PDF EPUB FB2

This book, the only one of its kind on the market, focuses on RF (Radio Frequency) power for use in semiconductor manufacturing equipment that generate a plasma for processing wafers. The concepts, equipment, and techniques covered in this book emphasize industrial applications, but are also applicable to most radio communications equipment/5(2).

Applications of radio-frequency power to plasmas: seventh topical conference, Kissimmee, FL, This chapter examines some of the key fundamentals of planar radio frequency inductively coupled plasmas (or RF ICPs) including the various modes of operation, hysteresis between modes, power.

The radio frequency discharge plasma sources are widely utilized to prepare functional thin films and to etch insulated layers in semiconductor devices in microelectronic industry.

Especially, a capacitively coupled plasma (CCP) is the most popular discharge because the equipment is very simple and almost maintenance free. However, there is a problem such as low-density plasma under low-gas Cited by: 1.

Contents Acknowledgements page vii 1 Introduction 1 Plasmas 1 Plasma processing for microelectronics 3 Plasma propulsion 9 Radio-frequency plasmas: E, H and W-modes Buy Radio-Frequency Power in Plasmas (AIP Conference Proceedings) on FREE SHIPPING on qualified orders Radio-Frequency Power in Plasmas (AIP Conference Proceedings): McWilliams: : Books.

The equipment for the synthesis of nanoparticles illustrated by the schematic diagram of Fig. consists of three major parts: (1) an induction plasma torch connected to an RF power supply, (2) a water-cooled cylindrical reactor chamber, and (3) a collection filter. Download: Download full-size image Figure Schematic drawing of a radio frequency thermal plasma process : Keitaro Nakamura.

This book, the only one of its kind on the market, focuses on RF (Radio Frequency) power for use in semiconductor manufacturing equipment that generate a plasma for processing wafers. The concepts, equipment, and techniques covered in this book emphasize industrial applications, but Price: $ In general, the influence of the excitation frequency on the power deposition in inductively coupled plasmas is not trivial.

Only in certain cases -e.g. Applications of radio-frequency power to plasmas book at the high pressure or low/high electron. Unfortunately, this book can't be printed from the OpenBook. If you need to print pages from this book, we recommend downloading it as a PDF.

Visit to get more information about this book, to buy it in print, or to download it as a free PDF. Below is the uncorrected machine-read text. Target audienceFusion scientists and engineers, plasma physicists, RF engineers, theoretical physicists and specialists of plasma-wave interaction, of the conferenceWave interaction with plasmas, such as heating, current generation, diagnostics, and confinement and profile applications in fusion devices, including tokamaks, stellarators, spherical tori, reverse field.

In many plasma applications, particularly CVD, having a high microwave power density is necessary to promote atomic hydrogen concentrations that are high enough to ensure deposition at high growth rates.

The production of such plasmas requires high electric fields that are only possible through the usage of microwave Applications of radio-frequency power to plasmas book.

@article{osti_, title = {Radio-frequency coupling to plasmas}, author = {Colestock, P L}, abstractNote = {A survey of the physics associated with coupling rf power to plasmas is given with emphasis on methods of analysis relevant to applications in the fields of plasma production, processing, and fusion research.

The significance of resonant versus nonresonant coupling methods is. Radio-frequency heating is a strong technology driver. Higher-power radio- frequency sources are under development in nearly all frequency regimes.

In the ICRF regime, new tetrodes have been developed by industry with cw power levels up to 3 MW; future directions include the possible development of. The device operates at MHz and an RF power of 2 kW.

It is located inside a low pressure vacuum vessel. Argon plasmas are easily ignited and inductively coupled above a threshold power of about 60 W. This system is able to generate a large-area plasma with an excellent power efficiency.

Radio Frequency coverage from any base station is determined by three factors; 1. The height of the antenna 2.

The type of antenna used 3. The Radio Frequency Power Level emitted. This is true no matter where the antenna is placedFile Size: KB. Low-temperature radio frequency plasmas are essential in various sectors of advanced technology, from micro-engineering to spacecraft propulsion systems and efficient sources of light.

The subject lies at the complex interfaces between physics, chemistry and engineering. Focusing mostly on physics, this book will interest graduate students and researchers in applied physics and electrical.

Radio Frequency heat is used for a variety of heating and drying applications, including: Ceramics, Foam, Fiberglass, Composites, Textiles, Food Tempering & Pasteurizing, Wood and Paper.

Drying times and cycle times reduced. Seafood blocks tempered in minutes. Abstract. The control of plasma characteristics is one of the important issues in many atmospheric pressure plasma applications.

In order to accomplish this control, a feasibility study was performed by investigating the role of helium gas in an argon glow plasma that were produced in ambient air by MHz radio-frequency power. “Effects of an external magnetic field, and of oblique radio-frequency electric fields on multipactor discharge on a dielectric”, A.

Valfells, L.K. Ang, Y.Y. Lau, and. Abstract. This chapter examines some of the key fundamentals of planar radio frequency inductively coupled plasmas (or RF ICPs) including the various modes of operation, hysteresis between modes, power balance of the plasma operating states and dynamics of the source electromagnetic fields in the presence of : Kanesh Kumar Jayapalan, Oi Hoong Chin, Chiow San Wong.

Goniche M et al 15th Topical Conf. on Radio Frequency Power in Plasmas (Moran, USA) AIP Conf. Proc. Crossref Google Scholar Hellsten T, Bergkvist T, Johnson T and Laxåback M 16th Topical Conf. on Radio Frequency. Low-temperature radio frequency plasmas are essential in various sectors of advanced technology, from micro-engineering to spacecraft propulsion systems and efficient sources of light.

The subject lies at the complex interfaces between physics, chemistry and : Cambridge University Press. The s were the incipient period of thermal plasma technology, spurred by the needs of aerospace the various methods of thermal plasma generation, induction plasma (or inductively coupled plasma) takes up an important role.

Early attempts to maintain inductively coupled plasma on a stream of gas date back to Babat in and Reed in   Abstract. This chapter is devoted to considerations on some possible applications of the surface waves (SWs) studied in the previous chapters.

SWs have a wide sphere of applications, but here we shall consider only the following areas: plasma electronics, including devices utilized for generation of super high frequency radiation and plasma-antenna systems; plasma production, namely the plasma Author: Volodymyr Girka, Igor Girka, Manfred Thumm.

Currently, the areas of study and application for the high-frequency plasmas include applications in the following domains: bio-medical, plasma displays, sources of particles and/or ionizing radiation, chemical analysis systems, gas analyzers, photodetectors, lasers, dynamic.

Reprinted from AMERICAN JOURNAL OF PHYSICS, Vol. 29, No. 7,July, Printed in U. Emission of Radio-Frequency Waves from Plasmas* G. BEKEFI AND SANBORN C.

BROWN Department of Physics and Research Laboratory of Electronics, Massachusetts Institute. We present a novel radio-frequency (RF) power supply and impedance matching to drive technological plasmas with customized voltage waveforms.

It is based on a system of phase-locked RF generators that output single frequency voltage waveforms corresponding to multiple consecutive harmonics of a fundamental frequency. These signals are matched individually and combined to drive Cited by: This feature allows the analysis and design of RF heating systems for applications as VASIMR-like plasma thrusters and plasma-surface-interaction (PSI) experiments.

In the present work, the theoretical basis and implementation of TOPCYL is presented, as well as the results obtained on simulating antennas for the ICRF and 2,45 GHz by: 1. Topics include elementary processes and general theories of plasma phenomena, plasmas in tokamaks, stellators and related experiments, plasmas produced by z-pinch and plasma-focus discharges, plasmas produced by intense laser beams, plasmas of microwave and glow discharges, plasmas in spark and arc discharges, plasmas in space, diagnostic.

Inductively Coupled Plasmas General Description Though simple and inexpensive, the original CCPs had a number of disadvantages, and a new generation of plasma sources was called for. For instance, the internal electrodes in CCPs introduced unnecessary impurities into the plasma.

Until dual. Figure 1 shows a schematic of a typical setup of a capacitively coupled plasma, 1,2 1. Lieberman and A. Lichtenberg, Principles of Plasma Discharges and Materials Processing (John Wiley & Sons, ).

Chabert and N. Braithwaite, Physics of Radio-frequency Plasmas (Cambridge University Press, ). which consists of two plane and parallel electrodes with circular surfaces that.

Plasma technology applications are being developed that could impact the global market for power, electronics, mineral, and other fuel commodities. Currently, plasma science is described as a revolutionary discipline in terms of its possible impact on industrial applications.

Plasma (ionized gas) can be generated when the electric field strength is high enough (~ volts/in) to break the air down. An example of this is when a high power laser (1 mega watt or higher) is focused down to a small spot, the electric.

A microwave system uses amplifiers that output up to watts of power radio frequency (RF) power to produce the arc that generates plasma. Most solutions work at GHz. A new technology provides ignition and highly efficient operation with the same electronic and couple network.

This kind of atmospheric-pressure plasmas is different. source: a plasma torch, a radio frequency (RF) coil, and RF power supply. Figure 1 shows their proximity to the rest of the instrument; Figure 2 is a more detailed view of the plasma torch and RF coil rela-tive to the MS interface.

The plasma torch consists of three con-centric tubes, which are usually made from quartz. In Figure 2, these are shownFile Size: KB.

Time-resolved electric probe techniques in radio frequency plasmas D. Ruzic and Jeffrey L. Wilson DepartmentoJNuclear Engineering, UniversityoJIllinois, Urbana, Illinois (Received 7 February ; accepted 12 May ) Time-resolved cross-sectional variation of plasma potential and electron energies were measured.

Applications of Microwave Discharges to High-Power Light Sources. Pages Waymouth, John F., Consultant. Preview Buy Chap19 € Semiconductor Processing Applications of Microwave Plasmas. Pages Paraszczak, J. (et al.) Microwave Discharges Book Subtitle Fundamentals and Applications Editors.

A survey of the physics associated with coupling rf power to plasmas is given with emphasis on methods of analysis relevant to applications in the fields of plasma production, processing, and fusion research. The significance of resonant versus nonresonant coupling methods is discussed and specific applications are described where these phenomena dominate the coupling by: 1.

Radio Frequency Power in Plasmas: Proceedings of the 18th Topical Conference (pp. American Institute of Physics. Vahala, L. L., and Vahala, G. Diffraction and Gaussian n parallel effects in lower hybrid wave propagation in tokamaks International Sherwood.

Power supply and impedance matching to drive technological radio-frequency plasmas with customized voltage waveforms. Franek J(1), Brandt S(1), Berger B(1), Liese M(2), Barthel M(2), Schüngel E(1), Schulze J(1).

Author information: (1)Department of Physics, West Virginia University, Morgantown, West Virginiaby:   High-density hydrogen and helium plasmas have been produced. The source has been designed as the basis for a linear plasma materials interaction (PMI) test facility that will generate particle fluxes Gamma(p) > 10(23) M-3 s(-1), and utilize additional ion and electron cyclotron heating to produce high parallel (to the magnetic field) heat.You may optionally sign up to attend the US/Japan RF Physics Workshop on the afternoon of Wednesday Ap from to pm.